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1

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Critical process parameters of an acetal-based deep-UV photoresist

Roeschert, Horst, Przybilla, Klaus J., Spiess, Walter, Wengenroth, Horst, Pawlowski, Georg, Novembre, Anthony E.

Year:

1992

Language:

english

File:

PDF, 960 KB

english, 1992

2

Chemical amplification & dissolution inhibition: a novel high performance positive tone deep UV resist.

PAWLOWSKI, GEORG, PRZYBILLA, KLAUS-JÜRGEN, SPIESS, WALTER, WENGENROTH, HORST, RÖSCHERT, HORST

Journal:

Journal of Photopolymer Science and Technology

Year:

1992

Language:

english

File:

PDF, 825 KB

english, 1992

3

Substituted polyhydroxystyrenes as matrix resins for chemically amplified deep UV resist materials

Georg Pawlowski, Ralph Dammel, Charlotte Eckes, Charlet R. Lindley, Winfried Meier, Klaus-Jürgen Przybilla, Horst Röschert, Walter Spiess

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 344 KB

english, 1991

4

The liquid-crystalline properties of selected cellulose derivatives

Walter P. Pawlowski, Richard D. Gilbert, Raymond E. Fornes, Suzanne T. Purrington

Journal:

Journal of Polymer Science Part B: Polymer Physics

Year:

1988

Language:

english

File:

PDF, 875 KB

english, 1988

5

Synthesis of Some 9-(Aminoalkyl)-6,7-dihydropyrimido[2,1-f]-purine-2,4,8-(1H,3H,9H)triones Synthese einiger 9-(Aminoalkyl)-6,7-dihydropyrimido[2,1-f]purin-2,4,8-(1H,3H,9H)trione

Maciej Pawlowski, Armin Buschauer, Walter Schunack

Journal:

Archiv der Pharmazie

Year:

1989

Language:

english

File:

PDF, 180 KB

english, 1989

6

Application aspects of a positive tone deep UV resist

Walter Spiess, Horst Röschert, Horst Wengenroth, Georg Pawlowski

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 391 KB

english, 1993

7

t-BOC blocked hydroxyphenyl-methacrylates: On the way to quarter micron deep-UV lithography

Klaus-jürgen Przybilla, Ralph Dammel, Georg Pawlowski, Horst Röschert, Walter Spiess

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 754 KB

english, 1992

8

The thermotropic and lyotropic liquid-crystalline properties of acetoacetoxypropyl cellulose

Walter P. Pawlowski, Richard D. Gilbert, Raymond E. Fornes, Suzanne T. Purrington

Journal:

Journal of Polymer Science Part B: Polymer Physics

Year:

1987

Language:

english

File:

PDF, 450 KB

english, 1987

9

Acetoacetylation of O-(hydroxypropyl)cellulose by 2,2,6-trimethyl-4H-1,3-dioxin-4-one

Walter P. Pawlowski, Richard D. Gilbert, Raymond E. Fornes, Suzanne T. Purrington

Journal:

Carbohydrate Research

Year:

1986

Language:

english

File:

PDF, 238 KB

english, 1986

10

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - DN 21, DN 41: negative-tone photoresists for deep-UV lithography

Roeschert, Horst, Dammel, Ralph R., Eckes, Charlotte, Kamiya, K., Meier, Winfried, Przybilla, Klaus J., Spiess, Walter, Pawlowski, Georg, Novembre, Anthony E.

Year:

1992

Language:

english

File:

PDF, 1.11 MB

english, 1992

11

X-Linked Wiskott–Aldrich Syndrome in a Girl

Parolini, Ornella, Ressmann, Gabriele, Haas, Oskar A., Pawlowsky, Johanna, Gadner, Helmut, Knapp, Walter, Holter, Wolfgang

Journal:

Boston Medical and Surgical Journal

Year:

1998

Language:

english

File:

PDF, 149 KB

english, 1998

12

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Progress in DUV resins

Przybilla, Klaus J., Roeschert, Heinz, Spiess, Walter, Eckes, Charlotte, Chatterjee, Subhankar, Khanna, Dinesh N., Pawlowski, Georg, Dammel, Ralph R., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 1.52 MB

english, 1991

13

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Delay-time stable chemically amplified deep-UV resist

Przybilla, Klaus J., Kinoshita, Yoshiaki, Kudo, Takanori, Masuda, Seiya, Okazaki, Hiroshi, Padmanaban, Munirathna, Pawlowski, Georg, Roeschert, Horst, Spiess, Walter, Suehiro, Natusmi, Hinsberg, Willi

Year:

1993

Language:

english

File:

PDF, 1.69 MB

english, 1993

14

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Structure-property relationship in acetal-based chemically amplified three-component DUV resist

Padmanaban, Munirathna, Kinoshita, Yoshiaki, Kudo, Takanori, Lynch, Thomas J., Masuda, Seiya, Nozaki, Yuko, Okazaki, Hiroshi, Pawlowski, Georg, Przybilla, Klaus J., Roeschert, Horst, Spiess, Walter, S

Year:

1994

Language:

english

File:

PDF, 852 KB

english, 1994

15

Novel photoacid generators: Key components for the progress of chemically amplified photoresist systems.

PAWLOWSKI, GEORG, DAMMEL, RALPH, PRZYBILLA, KLAUS-JÜRGEN, RÖSCHERT, HORSY, SPIESS, WALTER

Journal:

Journal of Photopolymer Science and Technology

Year:

1991

Language:

english

File:

PDF, 810 KB

english, 1991

16

New t-BOC blocked polymers for advanced lithographic applications.

PRZYBILLA, KLAUS-JÜRGEN, DAMMEL, RALPH, RÖSCHERT, HORST, SPIESS, WALTER, PAWLOWSKI, GEORG

Journal:

Journal of Photopolymer Science and Technology

Year:

1991

Language:

english

File:

PDF, 767 KB

english, 1991

17

Response to Sexual Films as a Function of Anxiety Level

Pawlowski, Walter

Journal:

Psychological Reports

Year:

1979

Language:

english

File:

PDF, 254 KB

english, 1979

18

Progress in acetal based deep UV resist.

Padmanaban, Munirathna, Kinoshita, Yoshiaki, Kudo, Takanori, Lynch, Thomas, Masuda, Seiya, Nozaki, Yuko, Okazaki, Hiroshi, Pawlowski, Georg, Przybilla, Klaus J., Roeschert, Horst, Spiess, Walter, Sueh

Journal:

Journal of Photopolymer Science and Technology

Year:

1994

Language:

english

File:

PDF, 489 KB

english, 1994

19

[American Thoracic Society American Thoracic Society 2020 International Conference, May 15-20, 2020 - Philadelphia, PA - ()] B28. HOST AND MICROBIAL CLINICAL STUDIES IN LUNG INFECTIONS AND LUNG DISEASES - The Narrow-Spectrum Antibiotic Treatment Score: A Novel Quantitative Tool for Assessing Broad- and Narrow-Spectrum Antibiotic Use in Severe Community-Acquired Pneumonia

Wang, A.A., Pickens, C.O., He, H., Scholtens, D.M., Pawlowski, A.E., Singer, B.D., Kruser, J.M., Walter, J.M., Donnelly, H., Wunderink, R.G.

File:

PDF, 118 KB

20

[American Thoracic Society American Thoracic Society 2020 International Conference, May 15-20, 2020 - Philadelphia, PA - ()] A59. CLINICAL DIAGNOSIS, PREDICTION AND OUTCOMES OF LUNG INFECTIONS - Microbiologic Diagnosis Is Associated with Differing Antibiotic Use Patterns in Severe Community-Acquired Pneumonia

Wang, A.A., Pickens, C.O., He, H., Scholtens, D.M., Pawlowski, A.E., Singer, B.D., Kruser, J.M., Walter, J.M., Donnelly, H., Wunderink, R.G.

File:

PDF, 71 KB